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CTP Plate

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Chemistry Free Negative CTcP Plate

Chemistry Free Negative CTcP Plate

Bridgehead Chimestry Free CTcP Plate is a negative-working plate with various advantages. Chemistry-free plates have already been widely accepted as one of the most important recent innovations to simplify platemaking in commercial printers.

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Product Details


Chemistry Free Negative CTcP Plate


Bridgehead Chimestry Free CTcP Plate is a negative-working plate with various advantages. Chemistry-free plates have already been widely accepted as one of the most important recent innovations to simplify platemaking in commercial printers. Elimination of the developer means that one of the main variables affecting image consistency disappears. Cleaning out the processor and disposing of exhausted developer is no longer required. The expensive plate processor itself is no longer needed.


Technical specifications

Plate type

chemistry-free CTcP Plate

Spectral   sensitivity

350~420 nm

Gauge

0.15 mm, 0.30 mm and etc.

Substrate

Electronically   grained ,anodized and hole sealing aluminum substrate

Laser energy

20-40 mJ/cm2

resolution

2~98% @200 lpi

developer

Not required

 latent image stability

7 days

Plate-making   contrast

Plate-making contrast is clearly. It can be measured with all   available densitometers and dot meter

storage   condition

Storage room   temperature≤25 ℃,relative humidity temperature≤60 %.

Shelf life

12 months under   recommended storage conditions.

Run length

100,000   impressions, depend on the specific printing conditon.

Baking

Not recommended

 

Matching chemicals

Plate   cleaner

Bridgehead chemistry-free printing plate cleaner

Washout gum

Bridgehead chemistry-free washout gum

Protective   gum

None required

Image   remover

compatible with CTP image remover

Fountain solution

Compatible with most fountain solution and alcohol fountain solution

Roller and brush

Glunz & Jensen chemistry-free cleaner is recommended.


Clean out unite

Plate width

200~830   nm

Plate length

310~1100   nm

Plate thickness

0.15~0.30   nm

Plate-rinsing speed

With a stable speed 0.6 m/min


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